JPH0570301B2 - - Google Patents

Info

Publication number
JPH0570301B2
JPH0570301B2 JP56192177A JP19217781A JPH0570301B2 JP H0570301 B2 JPH0570301 B2 JP H0570301B2 JP 56192177 A JP56192177 A JP 56192177A JP 19217781 A JP19217781 A JP 19217781A JP H0570301 B2 JPH0570301 B2 JP H0570301B2
Authority
JP
Japan
Prior art keywords
film
forming
resist pattern
wiring connection
wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56192177A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5893261A (ja
Inventor
Iwao Tokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP19217781A priority Critical patent/JPS5893261A/ja
Publication of JPS5893261A publication Critical patent/JPS5893261A/ja
Publication of JPH0570301B2 publication Critical patent/JPH0570301B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)
JP19217781A 1981-11-30 1981-11-30 半導体装置の製造方法 Granted JPS5893261A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19217781A JPS5893261A (ja) 1981-11-30 1981-11-30 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19217781A JPS5893261A (ja) 1981-11-30 1981-11-30 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5893261A JPS5893261A (ja) 1983-06-02
JPH0570301B2 true JPH0570301B2 (en]) 1993-10-04

Family

ID=16286956

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19217781A Granted JPS5893261A (ja) 1981-11-30 1981-11-30 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5893261A (en])

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4541168A (en) * 1984-10-29 1985-09-17 International Business Machines Corporation Method for making metal contact studs between first level metal and regions of a semiconductor device compatible with polyimide-filled deep trench isolation schemes
JPS61133648A (ja) * 1984-11-29 1986-06-20 テキサス　インスツルメンツ　インコーポレイテツド 半導体装置の製造方法
KR890007394A (ko) * 1987-10-31 1989-06-19 강진구 반도체 장치의 평탄화 방법
JPH04159755A (ja) * 1990-10-23 1992-06-02 Nec Kyushu Ltd 半導体装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5232234B2 (en]) * 1971-10-11 1977-08-19
JPS5728950B2 (en]) * 1973-04-25 1982-06-19
JPS5236975A (en) * 1975-09-18 1977-03-22 Fujitsu Ltd Process for production of semiconductor device
JPS6030111B2 (ja) * 1980-03-03 1985-07-15 株式会社東芝 半導体装置
JPS56126943A (en) * 1980-03-12 1981-10-05 Fujitsu Ltd Production of semiconductor device

Also Published As

Publication number Publication date
JPS5893261A (ja) 1983-06-02

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